The transistor was able to operate normally at temperatures ranging from room temperature to 1112 F (600 C).

(Image credit: Science Graphics)

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The team used dopants to create two semiconductor “wells” in the SiC around the transistor to avoid large leakage currents.

(Image credit: Science Graphics)

What to read next

“Over 600°C operation of ion-implantation-based SiC bottom-gate JFETs,” by Mitsuaki Kaneko, Shunya Shibata, and Tsunenobu Kimoto, APL Electronic Devices (2026). The article can be accessed at https://doi.org/10.1063/5.0346734.